- Product
- REACTOR
Products
REACTOR
REACTOR
[APPLICATION]
- Process Chamber Cleaning – Cycle cleaning of PECVD process chamber.
- Surface Treatment – Improvement of surface properties by reactive substitution and reactive etching.
- Etcher / PECVD - Deposited Metal Etching & Deposition with reactive gases.
[Advantage]
- Radio Frequency (13.56MHz)의 ICP Reactor.
- More than 90% of Process Gas can be dissociation - Process Gases (H2, NH3, NF3, N2O, SiH4, O2, N2, Ar…)
- Reliable Gas Source Supply via Cooling System.
Reactor Specifications
| No. | Item | Specification |
|---|---|---|
| 1 | Frequency | 13.56MHz |
| 2 | Current (Arms) | ≤ 35 Arms |
| 3 | Continuous Running Time | ≥ 10 Min |
| 4 | RF Input connector | Direct Connect |
| 5 | RF Output connector | Direct Connect |
| 6 | Reactor Gases | NF3, O2, Ar, H2 (@ALN Tube) and more |
| 7 | Cooling Method | PCW & CDA |
| 8 | Gas Inlet Port | ¼” VCR Male |
| 9 | PCW Port | 1/4 Lok Fitting (1.5 ~ 2 L/Min) |
| 10 | CDA Port | Main Inlet - 6 mm One Fitting |
| Reactor Inlet - 4 mm One Touch Fitting | ||
| Air Line 4 mm Tube Include | ||
| 11 | Ambient Temperature | 10 ~ 40 °C, Humidity : 20 ~ 60 % |
| 12 | Weight | Approx. 6 Kg |
| 13 | Dimension | 100(W) x 130(D) x 275(H) |
